METHOD OF FABRICATING A SUBSTRATE FOR DISPLAY PANEL

摘要

A manufacturing method of a substrate for a display device is provided to reduce the number of masks in a substrate manufacturing process by etching a passivation layer using a photoresist pattern thereon as a mask to expose a portion of a drain electrode of a thin film transistor, and etching a portion of the passivation layer exposed between the drain electrode and the photoresist pattern to form a undercut. A passivation layer(240) is formed on a substrate(100) on which a thin film transistor is formed. A photoresist(260) covering the passivation layer is deposited and then a photoresist pattern is formed. The passivation layer is etched using the photoresist pattern as a mask to expose a portion of a drain electrode(220) of the thin film transistor. A portion of the passivation layer exposed between the drain electrode and the photoresist pattern is etched to form an undercut(250).