| 摘要 |
<p>A monitoring system of an exposure apparatus and a control system including the same are provided to display a wafer processing number, a wafer processing time, and a total processing lot as well as an operating of the exposure apparatus. A first display section(1461) is used for displaying an operating state, a warning state, and an error state of an exposure apparatus. A second display section(1463) is used for displaying a processing number of a processing wafer in the exposure apparatus. A third display section(1465) is used for displaying a processing time of the wafer. A fourth display section(1467) is used for displaying a wafer processing lot number in the exposure apparatus.</p> |
