摘要 |
The appliance producing focused shock waves comprises a shock wave source (S), and an imaging system (1,2) consisting of refractory and or reflective elements, with which the shock waves leaving the shock wave source are bundled. The imaging system has a form diverging from the ideal for focusing onto a point, and whereby the non-linear propagation characteristic of the shock waves is compensatable. The imaging system consists of a rotationally symmetrical lens (1) and a rotationally symmetrical prism (2). |