GLASS PHOTOMASK EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a glass photomask exposure method by which manufacturing costs of a glass photomask can be reduced and a defective glass substrate can be effectively utilized.

SOLUTION: Exposure is performed multiple times using a plurality of glass photomasks 10 and 20 each having the same pattern. Thereby, an exposure error can be eliminated by performing exposure multiple times even when the glass photomasks 10 and 20 have defective parts 100 and 200 shielding light, manufacturing costs can be reduced as much as possible, the defective glass substrate can be effectively utilized and generation of the exposure error can be prevented.

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