| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To suppress the variation of the structure of a boundary of filters in respective colors of a color filter of an imaging device. <P>SOLUTION: A G color resist where green pigments are dispersed is applied to a flat film 104, and irradiated with exposure light to be developed to form G filters 103G of prescribed plane patterns. Next, a positive R color resist 113R where red pigments are dispersed is applied to the whole surface of the flat film 104 covering the G filters 103G, and irradiated with exposure light to be developed to form R filters 103R adjacently to the G filters 103G. The R color resist 113R is exposed using a mask having a light shielding part whose edge is positioned at a position entering area where the G filters 103G are formed from edges of the G filters 103G at boundaries with the G filters 103G in respective areas forming the R filters 103R. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
