发明名称 METHOD OF EVALUATING FILM AND METHOD OF EVALUATING FERROELECTRIC FILM
摘要 PROBLEM TO BE SOLVED: To provide a method of evaluating a film and a method of evaluating a ferroelectric film, which are capable of evaluating the film which retains the same condition as that before removing another film formed thereon even after the film formed thereon is removed. SOLUTION: The method comprises a process wherein the second film is removed from a specimen to be evaluated which includes a first film containing an oxide, and a second film arranged on the first film by spattering employing oxygen ion, and another process wherein the first film is evaluated. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006269959(A) 申请公布日期 2006.10.05
申请号 JP20050089169 申请日期 2005.03.25
申请人 SEIKO EPSON CORP 发明人 ASAOKA ICHIRO;KATO JIRO;ASAKAWA TSUTOMU;NAKADA MAYUMI
分类号 H01L21/66;G01N21/47;H01L21/8246;H01L27/105 主分类号 H01L21/66
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