THINNER COMPOSITION FOR REMOVING PHOTORESIST

摘要

The present invention relates to a thinner composition for removing photoresist used in the manufacture of semiconductor devices or liquid crystal displays. The composition includes a) propylene glycol monoalkyl ether acetate, b) alkyl lactate, and c) y-butyrolactone. The thinner composition of the present invention may further include at least one compound selected from the group consisting of d) a polyethylene oxide-based surfactant, and e) a fluorinated acrylic copolymer. The thinner composition for removing photoresist in accordance with the present invention is capable of effectively removing unwanted photoresist at the edge and back of glass substrates for organic ELs, as well as those used for manufacturing display devices, in a short period of time regardless of the particular photoresist used.