发明名称 SPUTTERING TARGET MADE FROM ALLOY COMPOSED OF Al, Ni AND RARE EARTH ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a sputtering target made from an alloy composed of Al, Ni and a rare earth element, which causes little warpage (deformation) when produced and while being used, can be precisely and efficiently produced, and can lead to a stable film-forming operation. <P>SOLUTION: The sputtering target made from the alloy composed of Al, Ni and a rare earth element is a sputtering target made from an Al-based alloy containing Ni and a rare earth element; and includes chemical compounds having an aspect ratio of 2.5 or higher and a circle equivalent diameter of 0.2 &mu;m or larger in an amount of 5.0&times;10<SP>4</SP>/mm<SP>2</SP>or more when a cross section perpendicular to a target plane is observed at a magnification of 2,000 times or higher. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006225687(A) 申请公布日期 2006.08.31
申请号 JP20050037937 申请日期 2005.02.15
申请人 KOBE STEEL LTD;KOBELCO KAKEN:KK 发明人 KUGIMIYA TOSHIHIRO;TAKAGI KATSUHISA;MATSUZAKI HITOSHI;KITASHITA KOTARO;YONEDA YOICHIRO
分类号 C23C14/34;C22C21/00 主分类号 C23C14/34
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