摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target made from an alloy composed of Al, Ni and a rare earth element, which causes little warpage (deformation) when produced and while being used, can be precisely and efficiently produced, and can lead to a stable film-forming operation. <P>SOLUTION: The sputtering target made from the alloy composed of Al, Ni and a rare earth element is a sputtering target made from an Al-based alloy containing Ni and a rare earth element; and includes chemical compounds having an aspect ratio of 2.5 or higher and a circle equivalent diameter of 0.2 μm or larger in an amount of 5.0×10<SP>4</SP>/mm<SP>2</SP>or more when a cross section perpendicular to a target plane is observed at a magnification of 2,000 times or higher. <P>COPYRIGHT: (C)2006,JPO&NCIPI |