| 摘要 |
An electrophotographic photosensitive member is provided in which electrophotographic properties including resolving power have been improved with minimized absorption of image exposure light at a short wavelength in a surface layer. The electrophotographic photosensitive member includes a photoconductive layer composed of a non-single-crystal silicon film and a surface region layer composed of a non-single-crystal silicon nitride film containing silicon atoms and nitrogen atoms, superimposed on a conductive substrate. The surface region layer has a gradient-composition layer in which the composition ratio between silicon atoms and nitrogen atoms is changed and a surface layer in which the composition ratio between them is constant. The gradient-composition layer and surface region layer contain a Group 13 element, and the content distribution of the element in the thickness direction of each layer has at least one local maximum value.
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