发明名称 Siloxane resin-based anti-reflective coating composition having high wet etch rate
摘要 Herein we disclose a composition, comprising a siloxane resin having the formula (HsiO<SUB>3/2</SUB>)<SUB>a</SUB>. (SiO<SUB>4/2</SUB>)<SUB>b</SUB>(HSiX<SUB>3/2</SUB>)<SUB>c</SUB>(SiX<SUB>4/2</SUB>)<SUB>d</SUB>, wherein each X is independently -O-, -OH, or -O-(CH<SUB>2</SUB>)<SUB>m</SUB>-Z<SUB>n</SUB>, wherein each m is independently an integer from 1 to about 5, Z is an 5 aromatic moiety, and each n is independently an integer from 1 to about 6; 0<a<1, 0<b<1, 0<c<1, 0<d<1, and a+b+c+d=1. We also disclose methods for preparing the siloxane resin composition and a method of preparing an anti-reflective coating on a substrate, wherein the anti-reflective coating is derived from the siloxane resin composition.
申请公布号 US2006194916(A1) 申请公布日期 2006.08.31
申请号 US20050552432 申请日期 2005.10.05
申请人 ZHONG BIANXIAO;MOYER ERIC S 发明人 ZHONG BIANXIAO;MOYER ERIC S.
分类号 C08L83/04;C08G77/38;C09D183/04 主分类号 C08L83/04
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