ETCHING AND CLEANING BPSG MATERIAL USING SUPERCRITICAL PROCESSING
摘要
<p>A method for etching and removing post-etch residue from a BPSG material is disclosed. In accordance with the method of the present invention, the BPSG material is etched and the residue is removed from the substrate structure using supercritical solutions.</p>
申请公布号
WO2006091909(A2)
申请公布日期
2006.08.31
申请号
WO2006US06768
申请日期
2006.02.22
申请人
SUPERCRITICAL SYSTEMS INC.;JACOBSON, GUNILLA;KEVWITCH, ROBERT;LOWE, MARIE
