Crystalline-si-layer-bearing substrate and its production method, and crystalline si device

摘要

A method for producing a substrate having a crystalline Si layer comprising the steps of forming an amorphous Si layer on a plastic substrate, and irradiating the amorphous Si layer with a laser beam to crystallize the amorphous Si, wherein the plastic substrate has light transmittance of 30 to 100% at an oscillation wavelength of the laser beam.