发明名称 PHOTOSENSITIVE MATERIAL FOR CONDUCTIVE FILM FORMATION, CONDUCTIVE FILM, TRANSLUCENT ELECTROMAGNETIC WAVE SHIELDING FILM, AND THEIR MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive material for conductive film formation, capable of manufacturing a conductive film having both high electromagnetic wave shielding properties and high translucency, and with improved pressure properties. SOLUTION: The photosensitive material, equipped with an emulsion layer containing silver-salt emulsion on a support body, and capable of manufacturing a conductive film by applying a development treatment on the emulsion layer after exposure, and further, applying physical development and/or a plating treatment, contains an anti-oxidant in the emulsion layer substantially arranged at the uppermost layer. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006228469(A) 申请公布日期 2006.08.31
申请号 JP20050038188 申请日期 2005.02.15
申请人 FUJI PHOTO FILM CO LTD 发明人 NAKAHIRA SHINICHI
分类号 H01B1/20;G03C1/00;G03C1/035;G03C1/08;G03C1/32;G03C1/43;G03C1/74;G09F9/00;H01B5/14;H01B13/00;H05K9/00 主分类号 H01B1/20
代理机构 代理人
主权项
地址