发明名称 |
Pattern transferring apparatus and pattern transferring method |
摘要 |
A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.
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申请公布号 |
US2006192928(A1) |
申请公布日期 |
2006.08.31 |
申请号 |
US20060364694 |
申请日期 |
2006.02.27 |
申请人 |
KASUMI KAZUYUKI;OTA HIROHISA;KAWAKAMI EIGO;NAKAMURA TAKASHI;TOKITA TOSHINOBU |
发明人 |
KASUMI KAZUYUKI;OTA HIROHISA;KAWAKAMI EIGO;NAKAMURA TAKASHI;TOKITA TOSHINOBU |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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