发明名称 |
CHEMICAL VAPOR DEPOSITION REACTOR HAVING MULTIPLE INLETS |
摘要 |
<p>A chemical vapor deposition reactor has a wafer carrier which cooperates with a chamber of the reactor to facilitate laminar flow of reaction gas within the chamber and a plurality of injectors configured in flow controllable zones so as to mitigate depletion. Each zone can optionally have a dedicated flow controller. Thus, flow through each zone can be individually controllable.</p> |
申请公布号 |
WO2006091448(A2) |
申请公布日期 |
2006.08.31 |
申请号 |
WO2006US05330 |
申请日期 |
2006.02.15 |
申请人 |
ELITE OPTOELECTRONICS, INC.;LIU, HENG |
发明人 |
LIU, HENG |
分类号 |
C23C16/00;C23C16/44;C23C16/455;C23C16/458;C30B25/14;C30B29/40 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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