发明名称 ELECTROSTATIC CHUCK, ELECTROSTATIC ATTRACTION METHOD, HEATING/COOLING TREATMENT DEVICE AND ELECTROSTATIC ATTRACTION TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electrostatic chuck to enable electrostatic attraction of an insulating substrate such as a glass substrate, and to provide a heating/cooling device for the insulating substrate and a temperature control method for the insulating substrate using the electrostatic chuck. SOLUTION: The electrostatic chuck is equipped with a dielectric substrate, in which a plurality of electrodes are arranged intricately to be adjacent to each other. A distance between adjacent electrodes of the plurality of electrodes is shortened, and the thickness of the dielectric substrate and the width of the electrode are thinned. Irregular field is formed on an adsorption surface of a dielectric by applying a potential difference between the electrodes. The dielectric substrate is attracted by gradient force generated by the irregular field. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006157032(A) 申请公布日期 2006.06.15
申请号 JP20060004865 申请日期 2006.01.12
申请人 TOTO LTD;ULVAC JAPAN LTD 发明人 KITABAYASHI TETSUO;HORI HIROAKI;UCHIMURA KENJI;TATENO NORIAKI;FUWA KO;MAEHIRA KEN
分类号 H01L21/683 主分类号 H01L21/683
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