PHOTOMASK BLANK HOUSING CONTAINER, METHOD FOR HOUSING PHOTOMASK BLANK, METHOD FOR STORING PHOTOMASK BLANK, METHOD FOR TRANSPORTING PHOTOMASK BLANK, AND METHOD FOR MANUFACTURING PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a photomask blank housing container which can suppress both of changes in the sensitivity of a resist film by gas contamination of a housed photomask blank and contamination by dust and which facilitates storage and transportation.

SOLUTION: The container for housing a photomask blank having a resist film formed thereon comprises at least a container body, a cover, and a gas adsorbing cassette, wherein the gas adsorbing cassette holds an organic gas adsorbent and/or a basic gas adsorbent and is detachably attached to one of the side faces or the bottom face of the container body and the upper face of the cover.

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