| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a diffuse reflection plate having sufficiently high scattering intensity and a manufacturing method therefore. <P>SOLUTION: In the method for manufacturing the diffuse reflection plate, firstly a photosensitive resin film 20 containing a photocrosslinkable monomer is subjected to pattern exposure (a pattern exposure process(b)). Next, the photosensitive resin film 21 subjected to pattern exposure is subjected to a heat treatment to diffuse the unreacted photocrosslinkable monomer, thereby forming a photosensitive resin layer 22 containing the unreacted photocrosslinkable monomer and having a rugged surface 2c (a heat treatment process (c)). Next, the rugged surface 2c of the photosensitive resin layer 22 is subjected to full-surface exposure to cause the crosslinking of the unreacted photocrosslinkable monomer, thereby forming a resin layer 2 having the rugged surface 2d (a full-surface exposure process (d)). A reflection film 3 is then formed on the rugged surface 2d of the resin layer 2 (a reflection film forming process (e)). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
