发明名称 EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method with high productivity by which deterioration in image quality due to fog by irradiation with leaked light is prevented in a standby period for image data processing prior to exposure while the light quantity is in a stable state without turning off a light source and transition from the standby period to an exposure operation is smoothly carried out. <P>SOLUTION: During a standby period after an alignment mark is read out by a CCD camera 24 and until image conversion process based on the read data is performed to start exposure in the exposure apparatus, a stage 14 is moved in an exposure direction at a calculated velocity in a position where the irradiation range by an exposure unit 18 is in a leaked light area 72 on a photosensitive material 30 or the photosensitive material 30 is out of the irradiation range by the exposure unit 18. The moving velocity is calculated based on the standby period and the distance from the position of the exposure unit 18 to the exposure start position 74 on the photosensitive material 30. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006154525(A) 申请公布日期 2006.06.15
申请号 JP20040347300 申请日期 2004.11.30
申请人 FUJI PHOTO FILM CO LTD 发明人 KITAGAWA TOMOYA
分类号 G03F9/00;B41J2/445 主分类号 G03F9/00
代理机构 代理人
主权项
地址