| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical measurement and evaluation method capable of being used for determining optimum conditions for optically detecting patterns formed in a plurality of layers. <P>SOLUTION: The optical measurement and evaluation method is constituted of a first step for optically photographing two patterns or more in a state of layered formation and acquiring images; a second step for cutting out regions containing the patterns in each layer from the images; a third step for computing a correlation function with a comparison pattern on every cut-out region; a fourth step for computing evaluation values indicating the sharpness of a peak of the correlation function for every region; a fifth step for computing such a comprehensive index as to place weight on a layer relatively restricting measurement precision through the use of the evaluation values computed for every region; and a sixth step for evaluating optimum values on the basis of the comprehensive index. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
