发明名称 MATERIAL FOR ELECTRON OR HOLE TRANSPORT LAYER AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide the material and the manufacturing method of an electron or hole transport layer. <P>SOLUTION: The material for a type of electron or hole transport layer includes at least a type of conjugate structure and at least a type of connection structure. The connection structure is either of the following group, that is, urethane and urea structures or their arbitrary combination. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006156933(A) 申请公布日期 2006.06.15
申请号 JP20050115415 申请日期 2005.04.13
申请人 HSIEH KUO-HUANG 发明人 RYO BUNKETSU;HSIEH KUO-HUANG;KAKU SHOKI;KUO LI-CHUNG;YANG KUEI-HUI
分类号 H01L51/50;C07C37/20;C07C39/21;C07D249/08;C07D271/10;C08G18/38 主分类号 H01L51/50
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