发明名称 |
MATERIAL FOR ELECTRON OR HOLE TRANSPORT LAYER AND ITS MANUFACTURING METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide the material and the manufacturing method of an electron or hole transport layer. <P>SOLUTION: The material for a type of electron or hole transport layer includes at least a type of conjugate structure and at least a type of connection structure. The connection structure is either of the following group, that is, urethane and urea structures or their arbitrary combination. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
申请公布号 |
JP2006156933(A) |
申请公布日期 |
2006.06.15 |
申请号 |
JP20050115415 |
申请日期 |
2005.04.13 |
申请人 |
HSIEH KUO-HUANG |
发明人 |
RYO BUNKETSU;HSIEH KUO-HUANG;KAKU SHOKI;KUO LI-CHUNG;YANG KUEI-HUI |
分类号 |
H01L51/50;C07C37/20;C07C39/21;C07D249/08;C07D271/10;C08G18/38 |
主分类号 |
H01L51/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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