发明名称 WINDING TYPE VAPOR DEPOSITION APPARATUS AND WINDING TYPE VAPOR DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a winding type vapor deposition appatatus which is excellent in productivity and capable of forming a metal film without causing the heat deformation of a base film comprising a single-layer plastic film, and a winding type vapor deposition method. SOLUTION: There is provided an electron beam irradiator 21 which irradiates the base film 12 with an electron beam before the deposition of the metal film, and a DC bias supply 22 whose positive and negative electrodes are connected to a can roller 14 and an auxiliary roller 18, respectively. Before the deposition of the metal film, the base film 12 is electrostatically charged by electron beam radiation to be attached to the can roller 14. After the deposition of the metal film, the base film 12 is attached to the can roller 14 by a bias voltage applied between the can roller 14 and the metal film which is electrically connected to the auxiliary roller 18. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006152448(A) 申请公布日期 2006.06.15
申请号 JP20060054308 申请日期 2006.03.01
申请人 ULVAC JAPAN LTD 发明人 HAYASHI NOBUHIRO;HIRONO TAKAHIRO;TADA ISAO;NAKATSUKA ATSUSHI
分类号 C23C14/56;G11B5/85 主分类号 C23C14/56
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