摘要 |
The present invention is directed to an immersion lithography proximity sensor having a nozzle shroud with a flow curtain. The immersion lithography proximity sensor includes a shroud that affixes to the nozzle. A plenum is located inside the shroud that holds a shroud liquid, which is fed into the plenum through one or more intake holes. The shroud liquid is emitted out through a series of openings, such as holes or slots, along a bottom surface of the shroud in a direction away from the nozzle. The shroud liquid that is emitted forms a curtain around the nozzle to prevent cross currents from impacting the flow of liquid out of the nozzle.
|