| 摘要 |
The present invention provides a gate structure having a diffusion barrier layer and the process for fabrication thereof. A diffusion barrier layer is formed between the polysilicon layer and the tungsten silicide metal layer by using ion implantation, thereby preventing silicon ion diffusion between the polysilicon layer and the tungsten silicide metal layer from forming in the gate re-oxidation process and preventing the lattice stress produced by stress variation, thereby reducing failure of the gate oxide layer.
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