发明名称 |
Method for patterning surface modification |
摘要 |
A method of patterning surface modification by (a) positioning a repositionable aperture mask in proximity to a substrate, and (b) selectively exposing a portion of the substrate to a surface modification treatment, wherein the exposed portion is defined by one or more apertures in the aperture mask.
|
申请公布号 |
US2006128165(A1) |
申请公布日期 |
2006.06.15 |
申请号 |
US20040010846 |
申请日期 |
2004.12.13 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
THEISS STEVEN D.;DUNBAR TIMOTHY D. |
分类号 |
H01L21/42 |
主分类号 |
H01L21/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|