| 摘要 |
<p>Embodiments of the present invention relate to the valve which is applied to the vacuum apparatus used in semiconductor manufacture line or display manufacture line, and relate to the rapid isolation valve which can intercept promptly and prevent the reverse flow of atmospheric pressure, due to the abrupt fault of the vacuum pump, into the vacuum apparatus. Embodiments of the present invention provide a function of a kind of delay channel (time delay) so that the cutoff valve may be intercepted before back pressure flows into the chamber through channels by making channels in the form of meanders by three cylindrical cylinders, and also can react by operating the cutoff valve promptly when back pressure occurs. In particular, it can promptly react to minute pressure differences by using the light alloy in the shape of peaked hat for the cutoff valve.</p> |
