| 摘要 |
A lithographic projection apparatus is disclosed. The apparatus includes a substrate support (WT) constructed to support a substrate (W), a projection system (PS) configured to project a patterned radiation beam onto a target portion of the substrate, and a frame (MF) onto which at least a part of the projection system is mounted. A fluid provider (FP) is arranged to provide a fluid between the substrate and a downstream end (B) of the projection system. The apparatus also includes an actuator (AC) associated with the frame and with the fluid provider and arranged to position the fluid provider, and a cushion system (PCS) for cushioning vibrational forces when the actuator positions the fluid provider.
|
