| 摘要 |
PROBLEM TO BE SOLVED: To provide a method with which photonic crystal is easily manufactured by combining methods which are comparatively diversified and well established in the technology. SOLUTION: A first thin film composed of a first material 4 is formed on a substrate 1 on which a shape of fine ruggedness is formed by a lithograph step and an etching (d). Next, a second thin film composed of a second material 5 having a refractive index different from that of the first material is formed (f). Further, a third thin film composed of the first material 4 is formed on the second thin film. A fourth thin film composed of the second material 5 is successively formed (g). Finally, the rugged part formed on the surface is removed by a CMP polishing to give a flat surface, thus the photonic crystal is completed (h). COPYRIGHT: (C)2005,JPO&NCIPI |
