发明名称 Semiconductor device and its manufacturing method
摘要 A semiconductor device comprises a semiconductor substrate; a trench formed in the semiconductor substrate or in a layer deposited on the semiconductor substrate; a first conductive layer deposited in the trench and having a recess in the top surface thereof; a buried layer which buries the recess of the first conductive layer and which is made of a material having a melting point lower than that of the first conductive layer; and a second conductive layer formed on the buried layer inside the trench and electrically connected to the first conductive layer.
申请公布号 US2005167720(A1) 申请公布日期 2005.08.04
申请号 US20050068853 申请日期 2005.03.02
申请人 发明人 FURUHATA TAKEO;MIZUSHIMA ICHIRO;SEKIHARA AKIKO;KISHIDA MOTOYA;HARADA TSUBASA;NAKAO TAKASHI
分类号 H01L23/52;H01L21/3205;H01L21/8234;H01L21/8242;H01L21/8244;H01L27/108;H01L31/119;(IPC1-7):H01L21/824 主分类号 H01L23/52
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