Method for Fabricating of Semiconductor Device,申请号KR20000078527-传众专利搜索

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发明名称	Method for Fabricating of Semiconductor Device
摘要
申请公布号	KR100504550(B1)	申请公布日期	2005.08.04
申请号	KR20000078527	申请日期	2000.12.19
申请人		发明人
分类号	H01L21/316;(IPC1-7):H01L21/316	主分类号	H01L21/316
代理机构		代理人
主权项
地址

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