| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To manufacture a multi-gradation exposure mask suitable for forming a scattering structure of a reflection film by using a stepper exposure machine. <P>SOLUTION: The exposure mask is suitable for forming a scattering structure of a reflection film of an electro-optic device such as a transflective or reflective liquid crystal display and has a light-shielding portion, a semitransmitting portion and light-transmitting portion part, so that a resin material deposited on a substrate is selectively removed to form a scattering structure. The exposure mask is manufactured in the following way: first, a semitransmitting layer is formed on a light transmitting substrate such as glass; a light-shielding layer is formed thereon; the light-transmitting portion is formed by simultaneously and partially removing the semitransmitting layer and the light-shielding layer, and a mark is simultaneously formed; and further, the light-shielding layer is partially removed to form the light-shielding portion and the semitransmitting portion. By using the obtained exposure mask in a stepper exposure machine or the like for exposure, a rugged pattern suitable for a scattering structure of a reflection film in a liquid crystal device can be formed by one time of exposure process. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
