| 摘要 |
PURPOSE:To prevent a pollutant from outdiffusing from an interlayer insulating films as well as the pollusion in a dielectric film forming furnace from occuring by a method wherein, after forming the interlayer insulating films, the high temperature treatment to form dielectric film is eliminated. CONSTITUTION:A dielectric film 10 is formed on the first electrode 5B to form interlayer insulating films 8B covering the dielectric film 10 while the interlayer insulating films 8B on the dielectric film 10 are removed to make an opening 11B. At this time, the dielectric film 10 is formed before the interlayer insulating films 8B and after forming the interlayer insulating films 8B, the high temperature treatment to form the dielectric film 10 can be eliminated. Through these procedures, phosphorus (pollutant) can be prevented from outdiffusing from the interlayer insulating films 8B further preventing the pollusion in a furnace from occuring.
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