发明名称 DEVICE FOR GLOW DISCHARGE DECOMPOSITION
摘要 PURPOSE:To obtain excellent amorphous semiconductor layers having high reliability by forming electrode plates by cylindrical shapes closed at the top ends and providing ejection ports for forming gases to the peripheral surfaces thereof at the time of forming the amorphous semiconductor layers on the surfaces of the plural cylindrical substrates by the single reaction chamber. CONSTITUTION:The device for glow discharge decomposition is installed with, for example, 4 pieces of the cylindrical substrates 4, at prescribed intervals, in the reaction chamber 1 into which the gases for forming the amorphous semiconductor layers are introduced. The electrode plates 2 for glow discharge are disposed to face the respective substrates 4 and the amorphous semiconductor layers are simultaneously formed on the surfaces of the four substrates 4 by the glow discharge generated between the substrates 4 and the electrode plates 2. The electrode plates 2 are made into the cylindrical shape closed at the top ends and are so constructed that the forming gases enter the inside of the reaction chamber 1 from the introducing port 3 and are ejected from the gas ejection ports 6 provided to the peripheral faces of the electrode plates 2 toward the substrates 4.
申请公布号 JPS63482(A) 申请公布日期 1988.01.05
申请号 JP19870075001 申请日期 1987.03.27
申请人 KYOCERA CORP;KAWAMURA TAKAO 发明人 HIGUCHI HISASHI;ISHIKI KOKICHI
分类号 H01L21/205;C23C16/24;C23C16/50;G03G5/08 主分类号 H01L21/205
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