| 摘要 |
PURPOSE:To uniformize the thickness of an LPE film irrespective of a wafer supporting position by elevationally supporting a wafer holder at a suitable interval through a ring having a play in a rotating direction, and gradually increasing the play toward the lower positions. CONSTITUTION:A holder 11 has a plurality of rings 12-16, a plurality of wirings 17 for supporting the rings 12-16 at suitable oblique angle, and holding metal fittings 4 welded at the upper ends of the wirings 17, and a wafer supporting ring 2 having a plurality of pawls 5 projected inward is supported to the inside of the rings 12-16 through a square-sectional pins 18 secured to the outside of the ring 2. The lengths of the through-holes 13a, 14a, 15a, 16a of the rings 13-16 are made larger toward the lower positions. When such metal fittings 4 are attached to a drive shaft of a liquid epitaxial device and dipped in a melt, LPE films are formed on the wafers 6. When the rotating direction is switched over, the production of the LPE film is temporarily stopped in response to the lengths of the holes, i.e., the play. Accordingly, the thicknesses of the LPE films are uniformized irrespective of the wafer supporting positions.
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