发明名称 |
Method for correction for chromatic aberration and exposure apparatus using the same |
摘要 |
Disclosed is an exposure apparatus used in a photolithographic process in fabrication of semiconductor devices. More particularly, in the exposure apparatus using an excimer laser, the beam splitter, mirror and lens for correction for chromatic aberration are combined in the alignment optical system. Furthermore, a mirror is disposed at the opposite side of the image pickup camera of the alignment key by way of the beam splitter.
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申请公布号 |
US4782368(A) |
申请公布日期 |
1988.11.01 |
申请号 |
US19870070715 |
申请日期 |
1987.07.07 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL, CO., LTD. |
发明人 |
OGAWA, KAZUFUMI;SASAGO, MASARU;ENDO, MASAYUKI;ISHIHARA, TAKESHI |
分类号 |
G03F9/00;(IPC1-7):G03B27/52 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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