| 摘要 |
PURPOSE:To prevent a dust particle from adhering to the surface of a semiconductor substrate by a method wherein, in a water washing device to wash a chemical liquid or the dust particle which has adhered to the substrate, a nozzle which jets a gas such as air or the like toward the surface of the water at an arbitrary angle and from an arbitrary height is installed. CONSTITUTION:When pure water is supplied from a water-supply pipe 2, a gas such as air or the like is jetted toward an appropriate direction from a jet orifice 1; by this setup, a dust particle and a chemical liquid contained in the pure water which is to be circulated inside a tank 3 can be excluded compulsorily and efficiently to the outside of the tank. Especially the dust particle has a property to float on the surface of the water inside the tank for many hours due to its surface tension; accordingly, if the gas such as air is jetted from the nozzle 1, it is possible to prevent this phenomenon. By this setup, it is made possible to prevent the dust particle from adhering to a semiconductor substrate 5.
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