| 摘要 |
PURPOSE:To obtain an exposure device which can monitor fluctuation of dimensions constantly and can check any failure alignment due to pitch deviations by calculating and storing pattern position information of a target mark entered through a detection optical system and a photoelectric conversion element, the target mark being provided on a mask and a wafer. CONSTITUTION:A pair of target marks 3 are provided on a mask 1 and a substrate 2. In a detection optical system, objective lenses 4 and relay lenses 5 constitute image-forming systems for detecting the target marks, and CCDs 6 are disposed at the image-forming positions. The CCDs 6 are provided because of branches by half mirror 7 to detect the amount of deviation in the X and Y directions of the target marks and two of them are provided for each system. The positions of images of the target marks 3 projected to the CCD 6 is calculated by a computer 11 through a CCD driving circuit 9 and an interface circuit 10 and stored. Thus, fluctuation of dimensions of masks or a wafer set on the exposure device is monitored at any time to know causes of mis-alignment. |
