| 摘要 |
PURPOSE:To uniformly and accurately etch Cr when a Cr-Cu two-layered film or a Cr-Cu-Cr three-layered film is patterned by selective etching through a positive type photosensitive resin. by using an aq. hydrochloric acid soln. contg. benzotriazole or a deriv. thereof as an etching soln. CONSTITUTION:A Cr layer 2 and a Cu layer 3 are successively formed on a glass substrate 1 or a Cr layer 4 is further formed and a positive type photosensitive resin 5 is put on the resulting two-or threelayered structure. The upper Cr layer 4 is etched with an etching soln. prepd. by adding 0.5g 1,2,3- benzotriazole to 100g 5N aq. hydrochloric acid soln. The Cu layer 3 is etched with 5wt.% aq. ammonium persulfate soln. The Cr layer is stably and selectively etched without etching the resin 5 and the Cu layer 3. |
