| 摘要 |
PURPOSE:To eliminate a difference in secondary electron beam detection rate with an inspection position and to perform high-accuracy inspection by providing a control grid with a slit and a table. CONSTITUTION:A substrate 10 to be inspected is irradiated with an electron beam with which scanning is executed in an X direction through the slit 5 of the control grid 6. Then when the electron beam strikes on a conductor on the substrate 10, secondary electrons are emitted. The secondary electrons pass through the grid 6 and are detected by secondary electron detectors 7a-7n. Further, the grid 6 prevents the secondary electrons from sticking on the substrate 10 again. Further, the entire surface of the substrate 10 is inspected by the table 9 which moves at right angle to the electron beam with which scanning is executed in the X direction. Thus, the difference in secondary electron detection rate with an inspection position is eliminated to improve the inspection accuracy. |
