PLASMA PROCESSOR

摘要

A processor comprises an evacuable chamber processing gas feed and circuitry to form an electrical field in the chamber, and a magnetic field orthogonal to the electric field. The magnetic field generator is rotatable w.r.t. a surface to be processed in plasma formed under the action of the two fields. The generator is pref. rotatable within a plane orthogonal to the electric field w.r.t. the surface, and comprises a magnet on a fixing plate and spreading towards the plate peripheral edge while encircling the centre. The N and S poles of the magnet are pref. alternately on the fixing plate and in point symmetry to the centre of rotation of the plate.