| 摘要 |
The invention relates to radiation-sensitive ethylenically unsaturated compounds, and a process for their preparation. The ethylenically unsaturated organic compounds correspond to the general formula <IMAGE> in which R stands for an alkyl radical, for an aryl radical or the radical R<1> and R<1> stands for the radical <IMAGE> where the radicals R<2> to R<6> stand for H, alkyl, OH, O-alkyl, SH, S- alkyl, halogen, N(alkyl)2, N(alkyl)(aryl) and at least one, but at most three, of the radicals R<2> to R<6> stand for the radical <IMAGE> in which X stands for an alkylene radical, cycloalkylene radical, an oxaalkylene radical or arylene radical, Y stands for H or CH3- and Z stands for O or NY. |
