PROCESS FOR FORMING PASSIVATED FILM

摘要

A process for a passivated film which is far reduced in the amount of gas discharge and can desorb an adsorbed gas more readily, which process comprises heating a stainless member with a surface roughness, Rmax, of 1.0.mu. m or less in an atmosphere of a mixture comprising oxygen gas and an inert gas and having a dew point of -95.degree.C or below, an impurity concentration of 10 ppb or less and an oxygen content 5ppm 25 vol% at 300 to 420 .degree.C.