| 摘要 |
METHOD FOR MODIFYING THE SURFACE OF FINELY DIVIDED SILICA In the present invention, finely divided silica is treated with two types of organosilicon compounds, (i) an organosilicon compound having the general formula wherein R is a monovalent hydrocarbon group; n is an integer having a value of 0 to 10; and Q is an alkoxy group, halogen atom, or hydroxyl group, and (ii) an organosilicon compound having the general formula (R3Si)a-Z wherein R is a monovalent hydrocarbon group; a is 1 or 2; when a eguals 1, Z is a hydrogen atom, halogen atom, hydroxyl group, alkoxy group, -NR12' -ONR12' or -OCOR1; when a equals 2, Z is -O- or -NR1-; and R1 is the hydrogen atom or an alkyl group. The present invention characteristically affords a finely divided silica which has a high dogree of surface treatment, which provides an elevated thixotropy when mixed with organopolysiloxane, and which provides stability in long-term storage. |
