| 摘要 |
<p>PURPOSE:To form patterns free from side edges and to prevent the residual films by resticking of pigments at the time of production by a photolithographic method by successively executing development processing in >=2 developing tanks which are lower in developer concn. stepwise on progression to succeeding stages. CONSTITUTION:A photosensitive resist material dispersed with pigments, i.e., color resist 2, are applied atop a substrate 1. A film 3 formed with prescribed patterns is then imposed on the substrate 1 and is irradiated with UV rays 4, by which the film is subjected to an exposing process. The developing stage to be executed next varies from heretofore and the development processing is executed dividedly at least twice with the developers of the different concns. Namely, the 1st development is executed in a short period of time by immersing the exposed substrate 1 into the 1st developing tank 5 contg. the high-concn. developer L1. The 2nd development is executed in a relatively long period of time by immersing the substrate 1 after the 1st development into the 2nd developing tank 6 contg. the low-concn. developer L2.</p> |
