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发明名称
(C2) ;Halbleiterbearbeitungsverfahren zur Herstellung integrierter Speicherschaltungen mit Stapelkondensatoren
摘要
申请公布号
DE4238827(A1)
申请公布日期
1993.05.27
申请号
DE19924238827
申请日期
1992.11.17
申请人
MICRON TECHNOLOGY, INC., BOISE, ID., US
发明人
RHODES, HOWARD E.;LOWREY, TYLER A., BOISE, ID., US
分类号
H01L27/04;H01L21/02;H01L21/74;H01L21/822;H01L21/8242;H01L27/10;H01L27/108
主分类号
H01L27/04
代理机构
代理人
主权项
地址
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