发明名称 CURING METHOD OF OPTICALLY-SHAPED MODEL
摘要 PURPOSE:To shorten an exposure time, reduce shape inner stress and minimize a deformation of a shape, by a method wherein UV rays are applied again to a model shaped of UV-curing resin by making use of 3D lithography technique from various directions and cured completely. CONSTITUTION:Optically-shaped model 2 is put on a mirror table 4 provided with turning motive power 5. UV rays to be exposed to the optically shaped model 2 through a UV lamp 1 installed on the upper part or an arbitrary position is applied to every nook and corner of the optically shaped model through a reflection mirror 3. Consequently, sufficient exposure to the whole surface of the optically-shaped model becomes possible. On this occasion, more uniform exposure becomes possible by tuning the mirror table 4.
申请公布号 JPH05338042(A) 申请公布日期 1993.12.21
申请号 JP19920145783 申请日期 1992.06.05
申请人 SEIKO EPSON CORP 发明人 SAITO KAZUYUKI
分类号 B29C35/08;B29C67/00;B29K105/24;(IPC1-7):B29C67/00 主分类号 B29C35/08
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