发明名称 IMMERSION EXPOSURE DEVICE AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 Provided is an immersion exposure device comprising a first optical member (8) having an injection face for injecting an exposure beam, a first mover (1) made movable relative to the first optical member while holding a substrate, a cover member (C) made movable according to the movement of the first mover and capable of, when positioned to face the injection face, holding a liquid in a space formed between itself and the injection face, a first holding portion (CH1) mounted in the first mover for holding the cover member, and a transfer unit (HC) for removing the cover member (C) from the first holding portion thereby to move the same independently of the first mover. The deterioration of the performance due to the cover member can be suppressed when the substrate is exposed through the liquid.
申请公布号 KR20090093935(A) 申请公布日期 2009.09.02
申请号 KR20097008628 申请日期 2007.11.30
申请人 NIKON CORPORATION 发明人 KIUCHI TOHRU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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