| 摘要 |
A manufacturing method of 5 gradation photomask, a 5 gradation photomask and a pattern transcription method are provided to manufacture the 5 gradation photomask which has different exposure light transmittance. A light shielding portion(11), a light-transmitting part(12), and a mask pattern comprising the first semi light-transmitting part(13A), the second semi light-transmitting part(13B), and the third semi light-transmitting part(13C) which have different exposure light transmittance. A photo mask blank having the first semi light-transmitting layer(16) and a light-shielding layer(15) are prepared. The first resist pattern is molded by forming and developing the resist film formed on the light-shielding layer of the photo mask blank. The first patterning is performed by etching the light-shielding layer. After the first resist pattern is removed, the second resist pattern is molded.
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