PATTERN DRAWING APPARATUS AND PATTERN DRAWING METHOD

摘要

A pattern drawing apparatus and pattern drawing method are provided to control the width of the subscanning direction of the unit pattern group. The mask means passes the light from the light source to form the unit phase on the substrate(9). A plurality of exposure means exposes the pattern(SLG) by irradiating intermittently the photosensitive material of the substrate. The main scanning means moves the substrate to the main scanning direction(Y) to the exposure means. The sub scanning means move intermittently the substrate to the subscanning direction(X) to the exposure means. The mask moving unit moves so that the opening of the mask means is arranged in the predetermined position.