| 摘要 |
<p>A detecting apparatus, an exposure apparatus, and a device manufacturing method are provided to improve the crystal precision of a restoration parameter by using the mean value of various mark elements of each location. A detecting apparatus(150) comprises an imaging device, an imaging optical system, and a signal processing unit(160). The imaging optical system forms the phase of an alignment mark, formed on a substrate, on the imaging device. The signal processing unit comprises the reconstruction filter having parameter. The signal processing unit applies reconstruction filter on the output signal produces recovered signals. The signal processing unit produces feature values corresponding to the shape of the alignment mark to a plurality of candidate values of parameter based on the recovered signals. The signal processing unit sets up parameter based on feature values.</p> |
